Conductive AFM (C-AFM) measurements on a polished IC surface with multiple transistor contacts

Sep 24, 2019 (Application Note) Here is a new Application Note from Nanosurf on conductive AFM (C-AFM) measurements on a polished IC surface with multiple transistor contacts. Chemical-mechanical polishing (CMP) is a standard manufacturing process employed in the semiconductor industry during the fabrication of integrated circuits and memory disks. When...