A unique pattering strategy based on resist nanokirigami

Mar 16, 2022 (Nanowerk News) Photoresist-based patterning strategies have been standardized for decades since the invention of photolithography. However, there are still major challenges in the processing of certain functional structures. For example, the standard resist-based high resolution patterning process usually requires point-by-point exposure of the target resist structures, leading...

Intensity control of projectors in parallel

Mar 16, 2022 (Nanowerk News) A challenge to adopting augmented reality (AR) in wider applications is working with dynamic objects, owing to a delay between their movement and the projection of light onto their new position. But, Tokyo Tech scientists may have a workaround. They have developed a method that...